1999-2003，山东大学电气工程学院，获学士学位
2003-2008，中国科学院电工研究所 硕博连读，获博士学位

2008年7月份到北方工业大学任教，从事集成电路测试、集成电路加工工艺方面的教学和科研工作

1. Lintao Liu, Xiaoli Zhu, Shuhua Wei*, Jing Zhang, Mikhail R. Baklanov, Alice Bastos da Silva Fanta, Jiebin Niu, and Changqing Xie, Influence of Current Density on Orientation-Controllable Growth and Characteristics of Electrochemically Deposited Au Films, Journal of The Electrochemical Society, 166 (1) D3232-D3237, 2019. (SCI  IF:3.662)

2. Chunhui Liu, Qi Qi, Dmitry S. Seregin, Alexey S. Vishnevskiy, Yingjie Wang, Shuhua Wei*,Jing Zhang, Konstantin A. Vorotilov, Fedor N. Dultsev, and Mikhail R. Baklanov*, Effect of terminal methyl groups concentration on properties of organosilicate glass low dielectric constant films, Japanese Journal of Applied Physics 57, 07MC01, 2018. (SCI  IF:1.452)

3. R. Nenashev, YingjieWang, Chunhui Liu, N. Kotova, K. Vorotilov, Jing Zhang, Shuhua Wei, D. Seregin, A. Vishnevskiy, Jihperng (Jim) Leu, and M. R. Baklanov*, Effect of Bridging and Terminal Alkyl Groups on Structural and Mechanical Properties of Porous Organosilicate Films, ECS Journal of Solid State Science and Technology, 6 (10) N182-N188, 2017. (SCI  IF:1.808)

4. Xu Wang, Lin-Tao Liu, Peng He, Xin-Ping Qu*, Jing Zhang, Shuhua Wei, Yuri A Mankelevich and Mikhail R Baklanov*, Study of CoTa alloy as barrier layer for Cu/low-k Interconnects, Journal of Physics D: Applied Physics (J. Phys. D: Appl. Phys.) 50, 405306 (10pp) , 2017. (SCI  IF:2.373)

5. Zhiqian Zhao, Jing Zhang*, Xiaolei Wang, Shuhua Wei, Chao Zhao,Wenwu Wang, Angle-resolved x-ray photoelectron spectroscopy study of GeOx growth by plasma post-oxidation, Chinese Physics B ,Vol.26,No.10(2017) 108201. (SCI  IF:1.321)

6. Shuhua Wei, Mengjie Zheng, Quan Xiang, Hailong Hu, Huigao Duan*, Optimization of  the particle density to maximize the SERS enhancement factor of periodic plasmonic nanostructure array，OPTICS EXPRESS，Vol. 24, No. 18, 5 Sep 2016. (SCI  IF:3.356)

7. Jing Zhang, Shuhua Wei*, Xiaolei Wang, Jinjuan Xiang, and Wenwu Wang，Experimental estimation of charge neutrality level of SiO2，Applied Surface Science，Vol. 422，p690-698, 2017.（SCI  IF:3.387）

8. Shuhua Wei, Minglong Qin, Jing Zhang, Mechanism and Application of Capillary-force Self-assembly Micro/nanofabrication，The 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO), p256-260, 18-22 July 2016. (EI：20170703344542)